The Primo nanova® tool is AMEC’s advanced 300mm etch product based on Inductively Coupled Plasma (ICP) technology. It is a cluster tool which can be configured with up to six chambers and two optional on-board integrated strip chambers. The chamber is symmetrical in design with high flow conductance. The ICP coils employ AMEC’s proprietary low capacitive coupling 3D coil design which enables more independent ion density and ion energy control. The chamber interior is coated with high-density plasma-resistant material for greater process repeatability and productivity. For wafer CD uniformity control, there is a high dynamic range multi-zone direct temperature-controlled ESC (electrostatic chuck). The product is intended for 1x or beyond etch applications for logic and memory devices.

Primo nanova®

Innovative etch solution for logic and DRAM devices at 1x and beyond

Products Features

Truly symmetric chamber design

Low capacitive coupling 3D coil design

High pumping speed with large capacity turbo pump (TMP)

Precise chamber wall temperature control

Advanced plasma-resistant interior coating

Multi-zone temperature-controlled ESC

Active impedance tuned focus ring design

Switchable dual frequency RF biasing

Integrated dual strippers

Durga ESC ready for selecting

Competitive Advantages

More independent ion energy and ion density controllability

Higher pumping conductance for wider process window

Excellent etch uniformity

Superior profile control for high aspect ratio application

High productivity p